Assembly and adjusting method of optical system, exposure...

Photocopying – Projection printing and copying cameras – Step and repeat

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S077000

Reexamination Certificate

active

11123975

ABSTRACT:
An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV light (Extreme Ultraviolet light) is reflected from the optical element and a phase distribution of which a light with a wavelength that is longer than the EUV light is reflected from the optical element, a second measuring step that measures a phase distribution of which the light passes the optical system, a deciding step that decides a phase distribution of which the EUV light passes through the optical system based on the phase distribution difference obtained by the first measuring step and the phase distribution measured by the second measuring step, and an adjusting step that adjusts at least one of a position and a posture of the optical element based on the phase distribution decided by the deciding step.

REFERENCES:
patent: 6266389 (2001-07-01), Murayama et al.
patent: 2002/0044287 (2002-04-01), Otaki
patent: 2003/0142322 (2003-07-01), Sato
patent: 2003/0144819 (2003-07-01), Takeuchi et al.
patent: 2003/0215053 (2003-11-01), Ichihara
patent: 2004/0075842 (2004-04-01), Dunn et al.
patent: 2006/0055940 (2006-03-01), Takeuchi et al.
patent: 1387220 (2004-02-01), None
patent: 1513023 (2005-03-01), None
patent: 1582908 (2005-10-01), None
patent: 2000-055840 (2000-02-01), None
patent: 2002-243669 (2002-08-01), None
Underwood, et al. “Layered Synthetic Mircrostructures as Breagg Diffractors for X-Rays and Extreme Ultraviolet: Theory and Predicted Performance”, Applied Optics Sep. 1, 1981 vol. 20 , No. 17 , pp. 3027-3034.
Malinowski, et al. “Cotrolling Contamination in MO/Si Multiplayer Mirrors by Si Sureface Capping Modifiations ”Proc. SPIE Jul. 2002, pp. 442-453.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Assembly and adjusting method of optical system, exposure... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Assembly and adjusting method of optical system, exposure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Assembly and adjusting method of optical system, exposure... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3898934

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.