Aspherical microstructure, and method of fabricating the same

Details Aspherical microstructure, and method of fabricating the same Aspherical microstructure, and method of fabricating the same

2005-04-05

2005-04-05

Everhart, Caridad (Department: 2825)

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Electromagnetic or particle radiation

C257S434000, C257S618000, C264S002500

Reexamination Certificate

active

06876051

ABSTRACT:
As a method of fabricating aspherical microstructures, a protruding microstructure is formed on a substrate, an aspherical-profile forming layer is formed on the substrate and the protruding microstructure, and the aspherical-profile forming layer is hardened. An aspherical profile is formed on the protruding microstructure due to a surface tension of the aspherical-profile forming layer in the step of forming the aspherical-profile forming layer, and the aspherical profile is maintained through the step of hardening the aspherical-profile forming layer.

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