Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1999-06-04
2000-09-12
Truong, Duc
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528127, 528128, 528488, 528499, 522111, 522146, 522149, 522155, 522162, 4302701, 4302801, 4302811, 430311, C08G 1400, C08G 802
Patent
active
061179671
ABSTRACT:
Disclosed is a polymer of the formula ##STR1## wherein A is ##STR2## or a mixture of ##STR3## wherein R is a hydrogen atom, an alkyl group, an aryl group, or mixtures thereof, B is one of specified groups, such as ##STR4## or mixtures thereof, and n is an integer representing the number of repeating monomer units.
REFERENCES:
patent: 2125968 (1938-08-01), Theimer
patent: 3367914 (1968-02-01), Herbert
patent: 3455868 (1969-07-01), D'Alessandro
patent: 3914194 (1975-10-01), Smith
patent: 4086209 (1978-04-01), Hara et al.
patent: 4110279 (1978-08-01), Nelson et al.
patent: 4435496 (1984-03-01), Walls et al.
patent: 4448948 (1984-05-01), Tsubaki et al.
patent: 4623558 (1986-11-01), Lin
patent: 4667010 (1987-05-01), Eldin
patent: 4739032 (1988-04-01), Jones
patent: 4801517 (1989-01-01), Frechet et al.
patent: 4806443 (1989-02-01), Yanus et al.
patent: 4806444 (1989-02-01), Yanus et al.
patent: 4818650 (1989-04-01), Limburg et al.
patent: 4935487 (1990-06-01), Yanus et al.
patent: 4956440 (1990-09-01), Limburg et al.
patent: 5030532 (1991-07-01), Limburg et al.
patent: 5268444 (1993-12-01), Jensen et al.
patent: 5336577 (1994-08-01), Spiewak et al.
patent: 5336720 (1994-08-01), Richards
patent: 5438082 (1995-08-01), Helmer-Metzmann et al.
patent: 5561202 (1996-10-01), Helmer-Metzmann et al.
patent: 5728498 (1998-03-01), Yanus et al.
Daly, "Chloromethylation of Condensation Polymers Containing an Oxy-1,4-Phenylene Backbone," Polymers Preprints (1979), vol. 20, No. 1, pp. 835-837.
Camps, "Chloromethylstyrene: Synthesis, Polymerization, Transformations, Applications," JMS-REV. Macromol, Chem. Phys., C22(3), 343-407 (1982-83).
Tabata, "Pulse Radiolysis Studies on the Mechanism of the High Sensitivity of Chloromethylated Polystyrene as an Electron Negative Resist," 1984 pp. 287-288.
Jurek, "Deep UV Photochemistry of Copolymers of Trimethylsilymethyl Methacrylate and Chloromethylstyrene," Polymer Preprints, 1988, pp. 546-547.
Hergenrother, "Poly(arylene ethers)," Polymer, 1988, vol. 29, Feb.
Havens, "Ethynyl-Terminated Polyarylates: Synthesis and Characterization," Journal of Polymer Science: Polymer Chemistry Edition, vol. 22 (1984), pp. 3011-3025.
Hendricks, "Flare, A Low Dielectric Constant, High Tg, Thermally Stable Poly(Arylene Ether) Dielectric for Microelectronic Circuit Interconnect Process Integration: Synthesis, Characterization, Thermomechanical Properties, and Thin-Film Processing Studies," Polymer Preprints 37(1) 150 (1996), vol. 37, No. 1, Mar. 1996, pp. 150-151.
Zupancic, "Styrene Terminated Resins as Interlevel Dielectrics for Multichip Modules," 1991, pp. 178-179.
Percec, "Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis, 2a)," Makromal Chem., 1984, pp. 1867-1880.
Percec, "Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis, 3a)," Makronal Chem., 1984, pp. 2319-2336.
Percec, "Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis 4. A New and Convenient Synthesis of p- and m-Hydrozymethylphenylacetylene," Polymer Bulletin 10, 223-230, 1983.
Amato, "A New Preparation of Chloromethyl Methyl Ether Free of Bis(chlorormethyl) Ether," 1979 Georg Thieme Publishers.
McKillopp, "A Simple and Inexpensive Procedure for Chloromethylation of Certain Aromatic Compounds," Tetrahedron Letters, vol. 24, No. 18, 1983, pp. 1933-1936.
Tepenitsyna, "Synthesis of Intermediates for Production of Heat Resistant Polymers (Chloromethylation of Diphenyl Oxide)," Zhurnal Prikladnoi Khimii, vol. 40, No. 11, Nov., 1967, pp. 2540-2546.
Fuller Timothy J.
Limburg William W.
Narang Ram S.
Pai Damodar M.
Renfer Dale S.
Byorick Judith L.
Truong Duc
Xerox Corporation
LandOfFree
Arylene ether alcohol polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Arylene ether alcohol polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Arylene ether alcohol polymers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-97141