Nanotechnology – Nanostructure – Nanosheet or quantum barrier/well
Reexamination Certificate
2007-01-23
2007-01-23
Wilczewski, M. (Department: 2822)
Nanotechnology
Nanostructure
Nanosheet or quantum barrier/well
C977S781000, C977S782000, C977S810000, C216S054000
Reexamination Certificate
active
10760697
ABSTRACT:
A method is disclosed for the induction of a suitable band gap and electron emissive properties into a substance, in which the substrate is provided with a surface structure corresponding to the interference of electron waves. Lithographic or similar techniques are used, either directly onto a metal mounted on the substrate, or onto a mold which then is used to impress the metal. In a preferred embodiment, a trench or series of nano-sized trenches are formed in the metal.
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Chou et al., Imprint Lithography with 25 Namometer Resolution, SCIENCE, Apr. 5, 1996, pp. 85-87, vol. 272.
Cox Isaiah Wates
Edelson Jonathan Sidney
Harbron Stuart
Tavkhelidze Avto
Borealis Technical Limited
Thomas Toniae M.
Wilczewski M.
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