Articles by plasma-activated chemical vapor deposition of fluori

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427109, 427167, 427489, 427490, 427491, 427578, 428421, 428428, 428446, 428523, B32B 2736

Patent

active

053344545

ABSTRACT:
The present invention refers to the deposition of thin film coatings produced by plasma-activated chemical vapor deposition of volatile fluorinated cyclic siloxanes of the structure [RR'SiO].sub.x, in which R is a hydrocarbon radical with 1-6 carbon atoms, R' is a fluorinated hydrocarbon radical with 3-10 carbon atoms, the carbon in the alpha and beta positions with respect to the silicon atom is hydrogenated and x is 3 or 4.

REFERENCES:
patent: 4643948 (1987-02-01), Diaz et al.

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