Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material
Patent
1995-12-22
1998-02-10
Tran, Minh-Loan
Active solid-state devices (e.g., transistors, solid-state diode
Non-single crystal, or recrystallized, semiconductor...
Amorphous semiconductor material
257 59, 257 72, 359 59, H01L 2904
Patent
active
057172234
ABSTRACT:
An array includes cells, each with a bottom gate amorphous silicon thin film transistor (a-Si TFT). Each a-Si TFT has an undoped amorphous silicon layer over its gate region and extending beyond its edges. Each a-Si TFT also has an insulating region with edges approximately aligned with the edges of its gate region. Two channel leads of doped semiconductor material such as microcrystalline silicon or polycrystalline silicon are on the undoped amorphous silicon layer, each overlapping an edge of the insulating region by a distance that is no more than a maximum overlap distance, which in turn is no more than 1.0 .mu.m.
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Hack Michael G.
Lujan René A.
Tran Minh-Loan
Xerox Corporation
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