Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-08-14
2007-08-14
Fourson, George R. (Department: 2823)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257S072000, C257SE27132, C438S149000, C349S043000
Reexamination Certificate
active
11166923
ABSTRACT:
An array substrate for a liquid crystal display device includes a substrate including a first driving region, a second driving region, and a pixel region, the pixel region including a switching region and a storage region; a first n-type transistor in the first driving region, a second p-type transistor in the second driving region; a third transistor in the switching region, the third transistor including a gate electrode, an active layer, a source electrode, and a drain electrode; an extension portion in the storage region and extending from the active layer; a metal pattern on the extension portion; a storage line over the metal pattern; and a pixel electrode in the pixel region and contacting the third transistor, wherein the metal pattern, the storage line and the pixel electrode form first, second and third electrodes of a storage capacitor that includes a first capacitor and a second capacitor parallel to each other.
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Fourson George R.
LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
Parker John M.
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