Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2005-03-01
2005-03-01
Wille, Douglas (Department: 2814)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S652000
Reexamination Certificate
active
06861368
ABSTRACT:
An array substrate for a liquid crystal display device includes: a substrate; a gate electrode on the substrate; a gate insulating layer on the gate electrode; a semiconductor layer on the gate insulating layer; source and drain electrodes on the semiconductor layer, the source and drain electrodes including a copper layer as an upper layer and a barrier layer as a lower layer; a first passivation layer on the source and drain electrodes; a second passivation layer on the first passivation layer, the second passivation layer having a drain contact hole through the first passivation layer, the drain contact hole exposing the barrier layer; and a pixel electrode connected to the barrier layer through the drain contact hole.
REFERENCES:
patent: 6121156 (2000-09-01), Shamble et al.
patent: 6529251 (2003-03-01), Hibino et al.
LG.Philips LCD Co. , Ltd.
McKenna Long & Aldridge LLP
Wille Douglas
LandOfFree
Array substrate for a liquid crystal display device having... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Array substrate for a liquid crystal display device having..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Array substrate for a liquid crystal display device having... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3400660