Arrangement for uniformly coating surfaces of revolution by vapo

Details Arrangement for uniformly coating surfaces of revolution by vapo Arrangement for uniformly coating surfaces of revolution by vapo

1981-09-03

1983-04-19

Smith, John D.

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118730, 118726, 118504, 4272555, C23C 1308

Patent

active

043802125

ABSTRACT:
Surfaces of revolution to be coated by vapor deposition are placed in centering holes of a rotary dome which is centrally seated on a rotary ring. The rotary ring centered by means of fixedly mounted guide and drive rollers so as to have an evaporative source located as close as possible to the axis of rotation of the dome and at the center of curvature of the dome. The substance, vaporized by heating in a high vacuum space, condenses on the substrates as a thin layer. From the variation of the layer thickness, the outline of a corrective mask is computed for a constant radiant intensity of the vapor in all utilizable directions in the space, while assuming a central, point source of evaporation. A corresponding corrective mask is then secured by means of a support to another rotary ring in close proximity to the surfaces of revolution to be coated, which other ring is centered in the same manner as the first rotary ring, but rotates in the opposite direction about the same axis. Under otherwise equal conditions and in spite of a deviation from ideal conditions, this results in a uniform coating of high precision, that is, in an equal layer thickness at all points of the surfaces of revolution which are equally spaced from the center of the surface.

REFERENCES:
patent: 3530824 (1970-09-01), Illsley et al.
patent: 3636916 (1972-01-01), Thelen et al.
patent: 4222345 (1980-09-01), Bergfelt et al.
patent: 4241698 (1980-12-01), Vitale

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