Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1979-08-15
1980-12-09
Smith, Alfred E.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
29579, 250491, H01L 21263, H01L 21308
Patent
active
042386853
ABSTRACT:
The disclosure pertains to alignment procedure applicable in the case of x-ray lithography which is to be effected with the help of a mask which is arranged between the semiconductor body and the radiation source. The disclosure is characterized by a fixed association of the mask with respect to the semiconductor body during alignment and a relative displacement of the source location of the x-ray beam with respect to the mask and semiconductor body for example by bodily movement of the x-ray source components. With this system, by displacement of the radiation beam at its source end by the order of millimeters one can obtain an effective adjustment of the mask with respect to the substrate of the order of approximately 0.1 .mu.m.
REFERENCES:
patent: 3742229 (1973-06-01), Smith et al.
patent: 3743842 (1973-07-01), Smith et al.
patent: 3984680 (1976-10-01), Smith
patent: 4169230 (1979-09-01), Bohlen et al.
Baskish, R., "Progress in X-ray Lithography," Electron and Ion Beam Science and Technology, Electrochem. Soc., Princeton, 1974, pp. 3-22.
Grigsby T. N.
Siemens Aktiengesellschaft
Smith Alfred E.
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