Arrangement for the fluid treatment, especially etching, of obje

Details Arrangement for the fluid treatment, especially etching, of obje Arrangement for the fluid treatment, especially etching, of obje

1974-06-17

1976-07-06

Bleutge, Robert L.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134113, 134154, 156345, B08B 302

Patent

active

039676323

ABSTRACT:
The arrangement includes a treatment fluid supply chamber, a first treatment chamber located above the treatment fluid supply chamber, and at least one additional treatment chamber located above the first treatment chamber. Objects are conveyed along a first predetermined path leading through the first treatment chamber and also along a second predetermined path leading through the additional treatment chamber. Treatment fluid is pumped up from the common treatment fluid supply chamber to both of said treatment chambers, and the thusly pumped fluid is discharged onto objects in both treatment chambers.

REFERENCES:
patent: 1406465 (1922-02-01), Lynch
patent: 1737938 (1929-12-01), Miller
patent: 2621673 (1952-12-01), Hodgens, Jr.
patent: 3266502 (1966-08-01), Copeland
patent: 3401068 (1968-09-01), Benton
patent: 3426773 (1969-02-01), Yatuni
Greene et al., "Photocell Controlled Etcher" IBM Tech. Disclosure Bulletin, Oct. 5, 1967, pp. 582-584.

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