Arrangement for the coating of substrates

Details Arrangement for the coating of substrates Arrangement for the coating of substrates

1991-01-09

1992-06-16

Weisstuch, Aaron

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429819, 20419212, C23C 1435

Patent

active

051222523

ABSTRACT:
The invention relates to an arrangement for the vapor deposition of thin layers on a substrate. This arrangement comprises a magnetron cathode with a target disposed opposite the substrate. With the aid of a particle generator ions of a reactive gas are generated and accelerated toward the substrate where a reaction takes place between target particles and reactive gas particles.

REFERENCES:
patent: 4492620 (1985-01-01), Matsuo et al.
patent: 4774437 (1988-09-01), Helmer et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 4946576 (1990-08-01), Dietrich et al.
D. M. Goebel et al, "Plasma Surface Interaction Experimental Facility (Pisces) For Materials and Edge Physics Studies," Journal of Nuclear Materials, vol. 121 (1984) pp. 277-282.

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