Arrangement for preventing the alteration of the primary beam by

Details Arrangement for preventing the alteration of the primary beam by Arrangement for preventing the alteration of the primary beam by

1978-08-29

1980-05-27

Dixon, Harold A.

Radiant energy

With charged particle beam deflection or focussing

With detector

250311, 250508, 313174, H01J 3516, G01K 108

Patent

active

042052327

ABSTRACT:
An arrangement relating to the prevention of the alteration of the primary beam by unwanted particles, such as sputter products, charged ions and electrons and their secondary processes, and to the resulting local improvement in the operational vacuum in electron-beam devices, ion-beam devices and in electron-energy analyzers and ion-mass analyzers using only three-dimensional metallic microstructures known as particle traps. Substantially, all the flat parts of the components of the instrument seen by the beams, such as electrodes, diaphragms, screening plates, housing walls and the like, consist of a metal having a low atomization rate and a very low desorption rate, such as titanium or zirconium or similar substances and their alloys. Apertures of less than 0.5 mm in diameter, situated close beside one another and extending substantially perpendicular to the surface, are provided in the surfaces of the components of the instrument, between which apertures a lattice structure remains located in the surface, the depth of the apertures being equal to or larger than their opening cross-section and the total cross-sectional area of the apertures corresponding to at least half the metal surface occupied thereby.

REFERENCES:
patent: 2886730 (1959-05-01), Sheldon
patent: 3727089 (1973-04-01), Chow
patent: 4123655 (1978-10-01), Maixner et al.
Electron Tubes by Walter H. Kohl, "Getter Material . . .", Chap. 16, pp. -577.

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