Arrangement for optically measuring the profile of a radiation r

Details Arrangement for optically measuring the profile of a radiation r Arrangement for optically measuring the profile of a radiation r

1986-11-10

1989-02-28

Wan, Gene

Optics: measuring and testing

By polarized light examination

With light attenuation

356375, G01B 1124

Patent

active

048080039

ABSTRACT:
An optical height measuring arrangement is described in which the radiation reflected from the surface to be measured is projected towards a position-dependent radiation-sensitive detection system via a lens system. The direction of the beam which is incident on the surface is varied at a high frequency and the amplitude of the output signal of the detection system is a measure of the distance to be measured. When two detection systems are employed it is also possible to measure the surface roughness.

REFERENCES:
patent: 3719421 (1973-03-01), Poilleux et al.
patent: 4017188 (1977-04-01), Sawatari
patent: 4158507 (1979-06-01), Himmel
patent: 4383168 (1983-05-01), Luck, Jr.
patent: 4427880 (1984-01-01), Kanade et al.
patent: 4579453 (1986-04-01), Makita
patent: 4627734 (1986-12-01), Rioux

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