Arrangement for measuring the light radiation of a plasma

Details Arrangement for measuring the light radiation of a plasma Arrangement for measuring the light radiation of a plasma

1991-09-06

1993-05-11

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419213, C23C 1434

Patent

active

052098303

ABSTRACT:
The invention relates to an arrangement for measuring the light radiation of a plasma with sputter cathodes. Herein a light-sensitive sensor (15) is acted upon by the light from an optical fiber or from a bundle of optical fibers (14) which is (are) guided through an opening (13) of the sputter cathode (8). In this way the light intensity of the sputter plasma in the region of the sputtering crater of a target (9) can be measured. Moreover, it is possible to measure in simple manner the light intensities of several regions of the plasma.

REFERENCES:
patent: 4166784 (1979-09-01), Chapin et al.
patent: 4983269 (1991-01-01), Wegmann
Gale et al., "A simple . . . optics", J. Vac. Sci. Technol., 20(1), Jan. 1982, pp. 16-20.
Severin: Sputtern, Physik in unserer Zeit, 1986, p. 73, Illustration upper right.

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