Arrangement for generating a plasma by means of cathode sputteri

Details Arrangement for generating a plasma by means of cathode sputteri Arrangement for generating a plasma by means of cathode sputteri

1993-09-24

1995-05-23

Breneman, R. Bruce

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20429808, 20429809, 20429819, C23C 1444

Patent

active

054178347

ABSTRACT:
The invention relates to an arrangement for generating a plasma by means of cathode sputtering. This arrangement comprises a magnetron and a target with shielding metal sheets. About these shielding metal sheets are wound two coils with a common center axis of which the one coil is connected to a dc power source and the other coil to a high-frequency source. Through the cooperation of the fields of both coils result helicon or whistler waves.

REFERENCES:
patent: 4990229 (1991-02-01), Campbell et al.
patent: 5126032 (1992-06-01), Szczyrbowski et al.
patent: 5277778 (1994-01-01), Daube et al.
patent: 5279669 (1994-01-01), Lee
Matsuo Yamashita: "Effect of magnetic field on plasma characteristics of built-in high-frequency coil type sputtering apparatus", J. Vac. Sci. Technol. A 7 (4), Jul./Aug. 1989, pp. 2752-2757.

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