Arrangement for electrolytic deposition of conductive material o

Details Arrangement for electrolytic deposition of conductive material o Arrangement for electrolytic deposition of conductive material o

1984-11-05

1985-12-31

Tufariello, T. M.

Chemistry: electrical and wave energy

Apparatus

Electrolytic

C25D 1706

Patent

active

045619603

ABSTRACT:
The arrangement which is designed to be put into an electrolytic vat comprises a framework arranged to receive several pairs of substrates placed back-to-back, mechanical systems fixed to the framework for positioning and maintaining the substrates in place on the framework and an electrical system likewise fixed to the framework and having contact points to enable coupling the conductive layers of the integrated circuits onto which the conductive material is to be deposited to the feed voltage source of the vat.
Preferably the mechanical systems are designed to maintain the two substrates of each pair in contact one against the other.

REFERENCES:
patent: 1749953 (1930-03-01), Tichtman
patent: 2199487 (1940-05-01), Etchison
patent: 3347771 (1967-10-01), Reznick
patent: 3429786 (1969-02-01), Kubik
Western Electric Technical Digest No. 19, Jul. 1970, pp. 17, 18.
High Capacity Liquid Phase Epitaxy Apparatus Utilizing Thin Melts, (Solid-State Electronics, 1973, vol. 16, pp. 1289-1295, Pergamon Press, Printed in G.B.) O. G. Lorimor, R. H. Saul, L. R. Dawson & C. R. Paola.

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