Arrangement for debris reduction in a radiation source based...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S071000, C378S034000, C378S035000

Reexamination Certificate

active

07079224

ABSTRACT:
The invention is directed to an arrangement for debris reduction in a radiation source based on a plasma, particularly for generating bundled radiation in the extreme ultraviolet (EUV) spectral region. The object of the invention, to find a novel possibility for beam shaping and debris reduction in a radiation source based on a plasma which substantially increases the life of collector optics without having to tolerate a substantial reduction in transparency or a sudden destruction of the protective mechanism, is met according to the invention in that exchangeable additional optics are arranged in the radiation path between a conventional debris filter and the collector optics, wherein a distance-increasing intermediate imaging of the source location relative to the collector optics is provided by the additional optics for further debris reduction.

REFERENCES:
patent: 6064072 (2000-05-01), Partlo et al.
patent: 6278764 (2001-08-01), Barbee et al.
patent: 6285737 (2001-09-01), Sweatt et al.
patent: 6359969 (2002-03-01), Shmaenok
patent: 6377651 (2002-04-01), Richardson et al.
patent: 6859259 (2005-02-01), Bakker et al.
patent: 6927403 (2005-08-01), Singer et al.
patent: 2003/0020890 (2003-01-01), Ogushi et al.
patent: 101 28 284 (2003-02-01), None
patent: 101 36 620 (2003-02-01), None
patent: 102 15 469 (2003-11-01), None
patent: WO 02/27406 (2002-04-01), None
Proceedings of SPIE, vol. 4146 (2000) pp. 128-131, Yamamoto et al. “Compact Debris Shutter Design of a laser-Produced Plasma Source for High NA Application”.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Arrangement for debris reduction in a radiation source based... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Arrangement for debris reduction in a radiation source based..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Arrangement for debris reduction in a radiation source based... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3541749

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.