Arrangement for coating substrates by vacuum deposition

Details Arrangement for coating substrates by vacuum deposition Arrangement for coating substrates by vacuum deposition

1982-03-11

1984-05-22

Smith, John D.

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118730, 118726, 118504, 4272555, C23C 1308

Patent

active

044494785

ABSTRACT:
An arrangement for coating substrates in an apparatus for vacuum deposition comprises a rotatable substrate holding structure in the form of a circular plate provided with holders for the substrates. The holders are arranged in circular rows around the axis of rotation of the plate so that the substrates held in the holder are arranged at axes such that those substrates in a single circular row have axes which intersect a single point along the axis of rotation of the plate. A vapor beam correction screen is mounted for rotation adjacent to the plate in an opposite direction about the same axis. A vapor beam correction screen is conformed in a stepwise manner to an even coating of spherical zones which have their center of curvature at the point of intersection of the substrate axes and are tangent to the poles of the respective substrates and cover the surface areas thereof.

REFERENCES:
patent: 3636916 (1972-01-01), Thelen et al.
patent: 4222345 (1980-09-01), Bergfelt et al.
patent: 4226208 (1980-10-01), Nishida et al.
patent: 4322592 (1982-03-01), Martin
patent: 4380212 (1983-04-01), Kraus
Dahke et al., "Semiconductor Wafer Dome For an Evaporator," IBM Technical Disclosure Bulletin, vol. 18, No. 7 p. 2171, Dec. 1975.

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