Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-01-10
1995-06-13
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429807, 20429823, 20429825, 20429835, 118718, 118719, 118723E, 118729, C23C 1434
Patent
active
054239710
ABSTRACT:
The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.
REFERENCES:
patent: 3461054 (1969-08-01), Vratny
patent: 3617459 (1971-11-01), Logan
patent: 3767551 (1973-10-01), Lang, Jr. et al.
patent: 3787312 (1974-01-01), Wagner et al.
patent: 4116806 (1978-09-01), Love et al.
patent: 4424101 (1984-01-01), Nowicki
patent: 4572842 (1986-02-01), Dietrich et al.
patent: 4719154 (1988-01-01), Hatwar
patent: 4728406 (1988-03-01), Banerjee et al.
patent: 4800174 (1989-01-01), Ishihara et al.
patent: 4803947 (1989-02-01), Ueki et al.
patent: 4851095 (1989-07-01), Scobey et al.
patent: 4874494 (1989-10-01), Ohmi
patent: 4920917 (1990-05-01), Nakatani et al.
patent: 4931169 (1990-06-01), Scherer et al.
patent: 5180434 (1993-01-01), DiDio et al.
patent: 5228968 (1993-07-01), Zejda
F. Vratny: Deposition of Tantalum and Tantalum Oxides by Superimposed RF and DC Sputtering, J. Electrochem. Soc., Vol. 114, No. 5 May 1967, pp. 505-508.
K. Kohler, J. W. Coburn, D. E. Horne, E. Kay: Plasma potential of 13.56 MHz rf argon glow discharges in a planary system, J. Appl. Phys, vol. 51 (1), Jan. 1985, pp. 59-66.
New mode of plasma deposition in a capacitively coupled reactor, T. Hamasaki et al, Appl. Phys. Lett. vol. 44 (11) 1 Jun. 1984, pp. 1049-1051.
Arnold Manfred
Blang Guido
Burkhardt Oliver
Gegenwart Rainer
Michael Klaus
Leybold Aktiengesellschaft
Weisstuch Aaron
LandOfFree
Arrangement for coating substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Arrangement for coating substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Arrangement for coating substrates will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1307064