Arrangement for cleaning semiconductor wafers using mixer

Details Arrangement for cleaning semiconductor wafers using mixer Arrangement for cleaning semiconductor wafers using mixer

1994-06-17

1995-05-16

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

1341022, 134902, 261 94, B08B 310

Patent

active

054151910

ABSTRACT:
For cleaning semiconductor wafers in a cleaning vessel by supplying a cleaning fluid through a supply line thereto, a mixer is provided. Deionized water is supplied to the mixer through a deionized water supply line, and a cleaning gas is supplied thereto from a gas reservoir to produce the cleaning fluid. After treating the semiconductor wafers with the cleaning fluid, the deionized water is supplied to the cleaning vessel to rinse them.

REFERENCES:
patent: 3227166 (1966-01-01), Martz
patent: 3882027 (1975-05-01), Lunt
patent: 4481154 (1984-11-01), Gough et al.
patent: 4485840 (1984-12-01), Erwin
patent: 4552783 (1985-11-01), Stoll et al.
patent: 4673443 (1987-06-01), Fetty
patent: 4778532 (1988-10-01), McConnell et al.
patent: 5089084 (1992-02-01), Chhabra et al.
Patent Abstracts of Japan, vol. 14, No. 425 (E-977) Sep. 13, 1990 & JP-A-2 164 035 (NEC Corp) Jun. 25, 1990.

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