Arrangement for aligning a mask and a substrate relative to each

Details Arrangement for aligning a mask and a substrate relative to each Arrangement for aligning a mask and a substrate relative to each

1986-07-21

1988-06-07

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

047492783

ABSTRACT:
An arrangement is described for aligning a mask (1) and a substrate (3) relative to each other by means of grating marks (M.sub.1, M.sub.2 ; P.sub.1, P.sub.2) in the mask and in the substrate. A diaphragm (32) is arranged in the path of the alignment beam (b') behind the mask grating (M.sub.2) and transmits only specific diffraction orders of the gratings (P.sub.2, M.sub.2), so that the alignment signal (S.sub.A) contains less undesired components and becomes more accurate.

REFERENCES:
patent: 4251160 (1981-02-01), Bouwhuis et al.

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