Arrangement and photometer for measuring and controlling the thi

Details Arrangement and photometer for measuring and controlling the thi Arrangement and photometer for measuring and controlling the thi

1977-06-16

1980-06-17

McIntosh, John P.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Sampling of associated base

118698, 118712, 118715, C23C 1300

Patent

active

042078350

ABSTRACT:
An arrangement and photometer for measuring and controlling the thickness of optically active thin layers wherein the axis of the measurement light beam coming from the measurement light source is directed to the measurement object and a referenced light receiver, independent of the optical properties of the measurement object, is associated with the measurement light beam. The output signal of the referenced light receiver is mixed with a trigger stage for a phase sensitive photometer amplifier and is fed to a compensation circuit for the equilization of brightness variations in the measurement light source.

REFERENCES:
patent: 3526460 (1970-09-01), Webb
patent: 4024291 (1977-05-01), Wilmanns

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