Arrangement and method for voltage measurement at a buried test

Details Arrangement and method for voltage measurement at a buried test Arrangement and method for voltage measurement at a buried test

1983-06-06

1986-03-18

Tokar, Michael J.

Electricity: measuring and testing

Determining nonelectric properties by measuring electric...

Beam of atomic particles

250311, G01N 2700

Patent

active

045771472

ABSTRACT:
In order to permit good test results in the voltage measurement of buried test subjects, an arrangement is provided having a particle beam probe for voltage measurement at a test subject which is spatially separated from a surface by a solid state substance. The solid state substance provides mobile charges disposed in insulated fashion between said test subject and the particle beam probe. A charge separation due to the influence of the test subject potential is produced in the solid state substance so that a potential on the surface of the solid state substance immediately adjacent to the particle beam probe becomes proportional to the potential on the test subject.

REFERENCES:
patent: 3448377 (1969-06-01), Seiwatz
patent: 3531716 (1970-09-01), Tarui
patent: 3549999 (1970-12-01), Norton
patent: 3671743 (1972-06-01), Nixon
patent: 3781574 (1973-12-01), White
patent: 3882391 (1975-05-01), Liles
patent: 4464627 (1984-08-01), Munakata
"VLSI Testing Using the Electron Probe", by H. P. Feuerbaum, Scanning Electron Microscopy, 1979, I SEM Inc., AMF, O'Hare, Illinois, pp. 285-296.
"Non-Charging Electron Beam Pulse Prober on FET Wafers", by L. Kotorman, Scanning Electron Microscopy, 1980, IV SEM, Inc., AMF, O'Hare, Chicago, Ill.-pp. 77-84.

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