Arrangement and method for compensating emitter tip vibrations

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S306000, C250S307000, C250S492210, C250S492200, C250S39600R, C250S310000, C250S42300F, C250S3960ML, C250S3960ML, C250S424000

Reexamination Certificate

active

07633074

ABSTRACT:
A charged particle beam apparatus with a charged particle beam source including an emitter with an emitter tip and a supporting member for supporting the emitter is provided. Further, the apparatus includes an emitter location measuring device for repeatedly measuring the location of the emitter and a deflector system for compensating variations in the location of the emitter.

REFERENCES:
patent: 5831379 (1998-11-01), Jeong et al.
patent: 2006/0071175 (2006-04-01), Kim et al.
patent: 02 061951 (1990-01-01), None
patent: 07 037503 (1995-02-01), None
patent: 08 298088 (1996-11-01), None
patent: 09 082253 (1997-03-01), None
patent: 10 135114 (1998-05-01), None
patent: 2000 077000 (2000-03-01), None
patent: 2001 167688 (2001-06-01), None
European Search Report dated Jun. 28, 2006.
EP Office Action dated Apr. 28, 2008.

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