Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1982-03-22
1984-06-05
Kaplan, G. L.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 501, 118723, 118728, 204192R, 219 7616, 219121PL, 313160, C23C 1500, C23C 1308
Patent
active
044526865
ABSTRACT:
An arc plasma generator comprises a consumable cathode, a cylindrical anode, and a focusing solenoid arranged coaxially with the consumable cathode. A power unit for maintaining the arc is electrically connected to the consumable cathode and the anode. In accordance with the invention the arc plasma generator further comprises a tubular plasma guide connected to an end face of the anode and an electromagnet. The electromagnet is arranged in the tubular plasma guide on the axis thereof and is enclosed in a housing made of a nonmagnetic material and having a cross-sectional area sufficient to conceal the cathode from the viewer's sight, looking in the direction of the cathode through the plasma guide. Also, the focusing solenoid is arranged on the tubular plasma guide and is connected in opposition with the coil of the electromagnet. A plasma arc apparatus for treating the surfaces of work-pieces comprises an arc plasma generator of the invention and an assembly for holding the work-piece to be treated. The assembly is a cover having a centrally-disposed opening. The cover is fixed on the end face of the plasma guide. The apparatus is also provided with a disk coil attached to the cover and connected in an aiding manner with the focusing solenoid.
REFERENCES:
patent: 3904505 (1975-09-01), Aisenberg
patent: 4321126 (1982-03-01), Kieferle et al.
P. C. Karr, Vacuum Deposition of Material Films . . . , IBM Technical Disclosure Bulletin, vol. 19, No. 5, Oct. 1976, pp. 1518-1520.
Article "Pulsed Metallic-Plasma Generators", by Alexander S. Gilmour, Jr. and David L. Lockwood, Proceedings of the IEEE, vol. 60, No. 8, Aug. 1972.
Axenov Ivan I.
Belous Vitaly A.
Khoroshikh Vladimir M.
Padalka Valentin G.
Kaplan G. L.
Leader William
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