Chemistry: electrical and wave energy – Apparatus – Vacuum arc discharge coating
Patent
1994-12-23
1998-03-24
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Vacuum arc discharge coating
20429805, 20419238, 20429811, 20429814, 20429815, 20429823, 20429825, 20429827, 20429828, 20429829, 118723VE, 118719, C23C 1432, C23C 1424
Patent
active
057308470
DESCRIPTION:
BRIEF SUMMARY
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to an arc ion plating device (hereinafter referred to as an AIP device), a coating device utilizing a vacuum arc discharge, and an arc ion plating system provided with the AIP device.
2. Description of the Related Art
An arc ion plating method is a method in which a vacuum arch discharge is generated between an anode and a cathode, a target, which are disposed in a vacuum chamber, and the cathode material is evaporated from the arc spots generated on the surface of the cathode, a solid body, and the vapor is accumulated on the surfaces of works disposed in the vacuum chamber to form a film on the works. AIP devices which realize an arc ion plating method are disclosed in Examined Japanese Patent Publication Nos. SHO 58-3033 and SHO 52-14690 by a snaper or suplef, and after that various kinds of improvements are done.
With the increasing demand for the application of the arc ion plating method as a technique of coating component parts for mass produced products with a hard film (for example, piston rings), it is considered to be an important subject to perform the coating of component parts with a hard film with high productivity.
A conventional AIP device for realizing high productivity, for example, an AIP device in which a work to be coated with a film is placed on a work table which can be freely taken into or taken out from a vacuum chamber is known to the public.
The basic constitution of such an AIP device as described in the above will be explained referring to FIGS. 23(a)-23(b) is a plan view and FIG. 23(b) is a longitudinal cross sectional view. There are an anode 2 and a flat-shaped evaporation source (a cathode) 3 which are fixedly provided and further works 5 which are placed on a work table 4 in a vacuum chamber 1. An arc power source 3a is connected to the anode 2 and the evaporation source 3, and when an arc discharge is generated between the anode 2 and the evaporation source 3 in a vacuum, a target material on the surface of the evaporation source 3 is instantaneously evaporated and spring out into a vacuum as metallic ions 6. The metallic ions 6 are accelerated by applying a bias voltage 7 to the works 5 and the metallic ions 6 are stuck to the surfaces of the works together with the reaction gas particles 8, and a fine hard film (TiN, TiC, TiCN, ZrN, Cr-N, etc.) is generated. The work table 4 has a built-in gear device which is to be in gear with a driving gear 9 for making the work 5 rotate in a direction "a" and at the same time the work table is also rotated to make the work 5 revolve. A shielding plate 12 having an opening in the radiating direction of the metallic ions 6 is provided inside the vacuum chamber 1.
Further, the vacuum chamber 1 comprises a door 10 and a rail 11. When the vacuum chamber 1 is released by the door 10, the work table 4 loaded with works 5 can be taken out along the rail 11 in the direction "c".
In the case of an AIP device, works are not handled one by one when they are taken into or taken out from the vacuum chamber 1, but a plurality of works are loaded on a work table beforehand and they can be taken into or taken out from the vacuum chamber 1 in a lot, so that the period of time for loading the works on the work table can be minimized, which is very beneficial for obtaining high productivity. An AIP device in which a film material can be evaporated uniformly and at a high speed from a flat evaporation source is disclosed, for example, in Unexamined Japanese Patent Publication No. HEI 4-224671. In the AIP device, a plurality of arc power sources are provided and power is supplied to each of the evaporation sources from each of the power supplies independently, and a high productivity is expected by uniformalizing the consumption of evaporation sources and making a high power operation possible.
Further, there is an AIP device in which the evaporation source is a rod shaped one, which is devised as a device being applicable to the use for the component parts as piston rin
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Fujii Hirofumi
Hanaguri Koji
Inoue Yoichi
Kawaguchi Hiroshi
Kido Toshiya
Breneman R. Bruce
Kabushiki Kaisha Kobeseikosho
McDonald Rodney G.
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