Arc heater method for the production of single crystal silicon

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

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423350, 252 623E, B01K 100, C01B 3302, C04B 3500, H01L 300

Patent

active

041027671

ABSTRACT:
A method for the production of single crystal silicon characterized by the steps of feeding into an arc heater a quantity of uncontaminated silicon halide to react with hydrogen or a metal reductant, such as sodium, to produce reaction products including liquid silicon and a gaseous salt of the reductant, depositing the liquid silicon on a downwardly inclined surface, and attaching a single seed crystal of silicon to the liquid silicon and withdrawing the single seed crystal from the liquid silicon so as to propagate a large single crystal.

REFERENCES:
patent: 524173 (1894-08-01), Jacques
patent: 732410 (1903-06-01), Homan
patent: 2904404 (1959-09-01), Ellis
patent: 2955966 (1960-10-01), Sterling
patent: 3325314 (1967-06-01), Allegretti
patent: 3522015 (1970-07-01), Maniero et al.
patent: 3649497 (1972-03-01), Kugler et al.
patent: 3963838 (1976-06-01), Setty et al.

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