Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1998-01-05
1999-06-22
Berman, Jack I.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250423R, 31511181, H01J 37317, H01J 3708
Patent
active
059144947
ABSTRACT:
The present invention relates to the fabrication of materials and structures having selected mechanical, thermal and electrical properties. More particularly, the invention relates to the use of these materials and structures in ion implantation systems. Structures comprising boron material provide components for use in implanters including arc chambers with which a beam of ions is generated for implantation into a target such as a semiconductor wafer.
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Berman Jack I.
ThermoCeramix, LLC
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