Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1997-05-12
1999-07-27
Kopec, Mark
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 3, 134 38, 510175, 510176, 510435, 510405, C11D 320, C11D 330, B08B 304
Patent
active
059284307
ABSTRACT:
An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of a polar amine solvent, about 22.5 to 15% by weight of a basic amine, especially hydroxylamine, a corrosion inhibitor and water. The stripping composition is effective for stripping photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures.
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Michelotti Francis
Ward Irl E.
Advanced Scientific Concepts Inc.
Delcotto Gregory R.
Kopec Mark
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