Aqueous stripping and cleaning compositions

Details Aqueous stripping and cleaning compositions Aqueous stripping and cleaning compositions

1997-10-16

1999-11-23

Lieberman, Paul

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 3, 134 38, 510176, C11D 726, C11D 732, B08B 304

Patent

active

059881860

ABSTRACT:
An aqueous stripping composition comprising a mixture of a polar amine, an organic or inorganic amine and a corrosion inhibitor which is gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.

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