Aqueous stripping and cleaning compositions

Details Aqueous stripping and cleaning compositions Aqueous stripping and cleaning compositions

1998-01-09

1999-12-07

Soderquist, Arlen

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

134 13, 134 2, 134 40, 510175, 510176, 510202, 510203, 510212, 510401, 510402, B08B 700

Patent

active

059976586

ABSTRACT:
An aqueous stripping composition comprising a mixture of an organic amine and a corrosion inhibitor which is benzotriazole alone or in combination with gallic acid, its ester or analog. The stripping composition is effective to strip photoresists, residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper or titanium containing substrates.

REFERENCES:
patent: 5563119 (1996-10-01), Ward
patent: 5597420 (1997-01-01), Ward
patent: 5795702 (1998-08-01), Tanabe et al.

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