Aqueous solutions of ammonium fluoride in propylene glycol and t

Details Aqueous solutions of ammonium fluoride in propylene glycol and t Aqueous solutions of ammonium fluoride in propylene glycol and t

1999-06-07

2000-07-18

Utech, Benjamin L.

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

438748, 438753, 438754, 438756, C09K 1300

Patent

active

060907215

ABSTRACT:
Compositions of ammonium fluoride, propylene glycol, and water and methods of using these compositions to remove etch residues from silicon substrates which result from plasma or reactive ion etching of silicon substrate are provided. Not only do the compositions of the present invention overcome the environmental concerns associated with the use of ethylene glycol, but unlike previous compositions of ammonium fluoride in propylene glycol which are acidic, the compositions of the present invention are neutral to slightly basic (i.e., pH 7 to about pH 8). Hence, they remove etch residues from silicon substrates with minimal attack on other features on the silicon substrates.

REFERENCES:
patent: 5571447 (1996-11-01), Ward et al.
patent: 5698503 (1997-12-01), Ward et al.
patent: 5874366 (1999-02-01), Sporer et al.
patent: 5939336 (1999-08-01), Yates
Wolf, S., et al., Silicon Processing for the VLSI Era vol. 1: Process Technology, Lattice Press, Sunset Beach, Calif., USA, pp. 514-537, 579-580, 1986.

Affiliated with

Also associated with

Rating

Aqueous solutions of ammonium fluoride in propylene glycol and t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aqueous solutions of ammonium fluoride in propylene glycol and t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aqueous solutions of ammonium fluoride in propylene glycol and t will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2036590