Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1997-09-23
1999-11-02
Gupta, Yogendra
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510421, 510434, 510477, 510488, 510505, 510506, 510522, C11D 1722
Patent
active
059770414
ABSTRACT:
The present invention is directed to an aqueous post-strip rinsing composition, comprising (1) water; (2) at least one water-soluble organic acid; and (3) at least one water-soluble surface-active agent, the rinse solution having a pH in the range from about 2.0 to about 5.0. The present invention is also directed to a method of using the above composition to remove residues from a semiconductor substrate.
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Gupta Yogendra
Olin Microelectronic Chemicals
Webb Gregory E.
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