Aqueous phosphoric acid compositions for cleaning...

Details Aqueous phosphoric acid compositions for cleaning... Aqueous phosphoric acid compositions for cleaning...

2007-06-26

2007-06-26

Ahmed, Shamim (Department: 1765)

Compositions

Etching or brightening compositions

C252S079200, C252S079300, C252S079400, C252S079500, C510S175000, C134S001300

Reexamination Certificate

active

10688900

ABSTRACT:
The present invention relates to dilute aqueous solutions containing phosphoric acid and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The solution according to the invention may advantageous contain an alkaline compound, one or more other acid compounds, and/or a fluoride-containing compound and may optionally contain additional components such as organic solvents, chelating agents, amines, and/or surfactants.

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Published Application US 2002/0035762 A1, Mar. 2002.

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