Aqueous monomer solutions adapted for direct photopolymerization

Details Aqueous monomer solutions adapted for direct photopolymerization Aqueous monomer solutions adapted for direct photopolymerization

1979-07-10

1981-10-13

Briggs, Sr., Wilbert J.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

422275, 526 88, 526235, 526258, 526263, 526287, 5263031, 526312, 526317, C08F 210, C08F 246

Patent

active

042946760

ABSTRACT:
Aqueous solutions of olefinically unsaturated hydrophilic monomers are deoxygenated, advantageously pH adjusted, and prepared for direct photopolymerization by photoinitiator addition and countercurrent scrubbing with an inert gas in a contactor column, preferably a packed column.

REFERENCES:
patent: 3912607 (1975-10-01), Communal et al.
patent: 4178221 (1979-12-01), Boutin et al.

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