Aqueous hydrides

Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Group ivb metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

423 89, 423 99, 423111, 423324, C01G 2300

Patent

active

045713286

ABSTRACT:
A coating comprising elemental silicon is electrodeposited on a substrate from an aqueous medium. The plating bath is a solution of what is described as one or more metal hydrides. The metal hydrides of the present invention are provided by combining stoichiometric amounts of metal, alkaline metal hydroxide and water in a preselected proportion by mole percent. The particular proportion is a function of the particular metal. A hydride concentrate is provided which is used in aqueous solution to provide a plating bath.

REFERENCES:
patent: 3493401 (1970-02-01), Schutt et al.
patent: 4029747 (1977-06-01), Merkl
patent: 4479824 (1984-10-01), Schutt

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Aqueous hydrides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aqueous hydrides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aqueous hydrides will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1550517

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.