Aqueous fluoride compositions for cleaning semiconductor...

Details Aqueous fluoride compositions for cleaning semiconductor... Aqueous fluoride compositions for cleaning semiconductor...

2008-07-15

2008-07-15

Barr, Michael (Department: 1792)

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

C134S003000, C134S026000, C134S028000, C510S175000, C510S176000

Reexamination Certificate

active

10826319

ABSTRACT:
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue from semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageously provide both cleaning efficiency and material compatibility.

REFERENCES:
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patent: 5981454 (1999-11-01), Small
patent: 6508887 (2003-01-01), Park et al.
patent: 6514352 (2003-02-01), Gotoh et al.
patent: 6773873 (2004-08-01), Seijo et al.
patent: 2002/0066465 (2002-06-01), Gotoh et al.
patent: 2003/0082912 (2003-05-01), Kezuka et al.
patent: 2004/0038254 (2004-02-01), Muramatsu et al.

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