Compositions – Etching or brightening compositions
Reexamination Certificate
2007-01-30
2007-01-30
Kopec, Mark (Department: 1751)
Compositions
Etching or brightening compositions
C252S079500, C106S003000, C106S287340, C106S442000, C106S447000, C106S482000, C106S489000, C438S691000, C438S693000, C423S335000, C428S403000, C428S404000, C051S307000, C516S086000, C516S093000, C501S128000
Reexamination Certificate
active
10078373
ABSTRACT:
Aqueous dispersion containing a silicon-aluminum mixed oxide powder, the powder containing 0.1 to 99.9 wt. % Al2O3and Si—O—Al-bonds. The dispersion can be produced using dispersing and/or grinding devices which a achieve an energy input of at least 200 KJ/m3. The dispersion can be used for the chemical-mechanical polishing of semiconductor substrates.
REFERENCES:
patent: 5382272 (1995-01-01), Cook et al.
patent: 5407615 (1995-04-01), Norville
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5804513 (1998-09-01), Sakatani et al.
patent: 5858813 (1999-01-01), Scherber et al.
patent: 5891205 (1999-04-01), Picardi et al.
patent: 5954997 (1999-09-01), Kaufman et al.
patent: 6048577 (2000-04-01), Garg
patent: 6294106 (2001-09-01), Pryor
patent: 6375693 (2002-04-01), Cote et al.
patent: 6455455 (2002-09-01), Deller et al.
patent: 6620508 (2003-09-01), Inoue et al.
patent: 2001/0042493 (2001-11-01), Scharfe et al.
patent: 2003/0095905 (2003-05-01), Scharfe et al.
patent: 2285792 (2000-04-01), None
patent: 2307057 (2000-10-01), None
patent: 198 47 161 (2000-04-01), None
patent: 198 47 161 (2000-04-01), None
patent: 0 773 270 (1997-05-01), None
patent: 0 876 841 (1998-11-01), None
patent: 1 048 617 (2000-11-01), None
patent: 1 048 617 (2000-11-01), None
patent: 1 065 251 (2001-01-01), None
patent: 2 063 695 (1981-06-01), None
patent: 2000-109810 (2000-01-01), None
patent: 2000-109810 (2000-04-01), None
patent: 2000-133621 (2000-05-01), None
patent: 2000-265161 (2000-09-01), None
patent: WO 00/17282 (2000-03-01), None
patent: 99/05232 (1999-02-01), None
patent: 00/17282 (2000-03-01), None
patent: WO 01/25366 (2001-04-01), None
Ullmann's Enz. tech. Chem., 4thEd., vol A23, pp. 694-696.
Lortz Wolfgang
Mangold Helmut
Menzel Frank
Bijayakumar Kallambella
Degussa - AG
Kopec Mark
LandOfFree
Aqueous dispersion, process for its production and use does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Aqueous dispersion, process for its production and use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aqueous dispersion, process for its production and use will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3819020