Aqueous developing solutions for reduced developer residue

Details Aqueous developing solutions for reduced developer residue Aqueous developing solutions for reduced developer residue

1998-04-29

1999-07-13

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Nonradiation sensitive image processing compositions or...

Developer

430311, 430331, G03F 732

Patent

active

059225220

ABSTRACT:
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula:
where AO are alkylene oxide units selected from ethylene oxide units (CH.sub.2 --CH.sub.2 --O) and propylene oxide units (CH(CH.sub.3)--CH.sub.2 --O) or (CH.sub.2 --CH(CH.sub.3)--O), where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 8, and the molar ratio of total ethylene oxide units to total propylene oxide units is between about 1:4 and about 4:1, preferably between about 2:3 and about 3:2.

REFERENCES:
patent: 5030550 (1991-07-01), Kawabe et al.
patent: 5106724 (1992-04-01), Nogami et al.
patent: 5122438 (1992-06-01), Nogami et al.
patent: 5217848 (1993-06-01), Uehara et al.
patent: 5340703 (1994-08-01), Masumi et al.
patent: 5364736 (1994-11-01), Eramo, Jr. et al.
patent: 5368982 (1994-11-01), Suzuki et al.
patent: 5393643 (1995-02-01), Lundy et al.
patent: 5457011 (1995-10-01), Lehr et al.
patent: 5573893 (1996-11-01), Fujimoto et al.
patent: 5576145 (1996-11-01), Keil et al.
patent: 5595860 (1997-01-01), Ishikawa et al.
patent: 5609991 (1997-03-01), Briguglio et al.

Affiliated with

Also associated with

Rating

Aqueous developing solutions for reduced developer residue does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Aqueous developing solutions for reduced developer residue, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Aqueous developing solutions for reduced developer residue will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2274868