Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-02-03
1983-08-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430158, 430163, 430176, 430188, 430302, 521 28, 525389, 525440, 525442, 525456, 20415919, 20415921, 260141F, G03C 154, G03C 160, G03C 171
Patent
active
044017430
ABSTRACT:
A light-sensitive adduct comprising the combination of a diazo resin having a plurality of pendant diazonium groups and a sulfonated polymer having a plurality of sulfonate groups and a presensitized light-sensitive article comprising a substrate having a light-sensitive coating which is comprised of the light-sensitive adduct on a surface thereof. After imagewise exposure, unexposed portions of the coating are removable by water or aqueous developers.
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Rauner, F., et al., Abstract of Ser. No. 8,061, filed 2/1970, Publ. in 8760G816, on 7/28/1970, 430-176.
Chemical Abstracts, vol. 85, #54617e, 1976.
Alexander Cruzan
Bowers Jr. Charles L.
Chernivec Gerald F.
Minnesota Mining and Manufacturing Company
Sell Donald M.
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