Aqueous developable photosensitive composition and printing plat

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430158, 430163, 430176, 430188, 430302, 521 28, 525389, 525440, 525442, 525456, 20415919, 20415921, 260141F, G03C 154, G03C 160, G03C 171

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active

044017430

ABSTRACT:
A light-sensitive adduct comprising the combination of a diazo resin having a plurality of pendant diazonium groups and a sulfonated polymer having a plurality of sulfonate groups and a presensitized light-sensitive article comprising a substrate having a light-sensitive coating which is comprised of the light-sensitive adduct on a surface thereof. After imagewise exposure, unexposed portions of the coating are removable by water or aqueous developers.

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patent: 4307219 (1981-12-01), Larson
Rauner, F., et al., Abstract of Ser. No. 8,061, filed 2/1970, Publ. in 8760G816, on 7/28/1970, 430-176.
Chemical Abstracts, vol. 85, #54617e, 1976.

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