Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1984-12-27
1986-10-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430158, 430160, 430161, 430302, G03C 160, G03C 154, G03C 194, G03F 708
Patent
active
046185623
ABSTRACT:
An improved negative working photographic element is prepared by coating a suitable substrate with a photosensitive composition comprising an admixture of two light sensitive diazonium salts and a binder composition comprising a polyvinyl acetate resin and a styrene/maleic acid half ester copolymer. Upon imagewise exposure of the element to actinic radiation through a suitable mask, the unexposed portions are removable with an aqueous alkaline developer.
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Liu Shuchen
Walls John E.
American Hoechst Corporation
Blasko John P.
Bowers Jr. Charles L.
Roberts Richard S.
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