Aqueous developable high performance photosensitive curable arom

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...

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347 20, 347 47, 522 79, 522 80, 522162, 522163, 522164, 522165, 522166, 525471, 525534, 525540, 525905, 525906, 525907, 525912, 528220, 528310, 528372, 528125, 528126, 528127, 528171, 528174, 4302701, 4302801, 4302811, C08F 250, G03F 7004, C08G 802, C08G 6538

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060078774

ABSTRACT:
Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymers.

REFERENCES:
patent: 2125968 (1938-08-01), Theimer
patent: 3367914 (1968-02-01), Herbert
patent: 3455868 (1969-07-01), D'Alessandro
patent: 3914194 (1975-10-01), Smith
patent: 4086209 (1978-04-01), Hara et al.
patent: 4110279 (1978-08-01), Nelson et al.
patent: 4435496 (1984-03-01), Walls et al.
patent: 4623558 (1986-11-01), Lin
patent: 4667010 (1987-05-01), Eldin
patent: 5268444 (1993-12-01), Jensen et al.
patent: 5336720 (1994-08-01), Richards
patent: 5438082 (1995-08-01), Helmer-Metzmann et al.
patent: 5561202 (1996-10-01), Helmer-Metzmann et al.
patent: 5681888 (1997-10-01), Nomura et al.
patent: 5753783 (1998-05-01), Fuller et al.
patent: 5761809 (1998-06-01), Fuller et al.
Chloromethylation of Condensation Polymers Cont. An Oxy-1, 4 Phenylene Backbone, Polymer Preprints (1979) vol. 20(1), 835 Wm. H. Daley, Supon Chotiwana & Ralph Nielsen.
Chloromethylstyrene: Synthesis, Polymerization, Transformations, Applications JMS-Rev. Micromal, Chem. Phys. C22 (3),343-407 (1982-83) Marcel Camps, Michael Chatzopoulos & Jean-Pierre Montheard.
Pulse Radiolysis Studies on the Mechanism of the Hegt Sensitivity of Chloromethylated Polystrene as an Electron Negotive Resist. Lithography 25(1) 287(1984) Y. Tabuta, S. Tagawa, & M. Washio.
Deep UV Photochemistry of Copolymers Trimethlsilymethyl Methacrylate and Chloromethylstyrese. Polymer Preprints 29(1) 1998. M. J. Jurek, A. E. Novembre, I.P. Heyward, R. Gooden, E. Reichmenis.
Poly (arylene ethers) Polymer vol. 29, 1988, Feb. p. 358 P.M. Hergenrother, B.J. Jensen, & S.J. Houens.
Ethynl--Terminated Polyarylates: Synthesis & Characterization J. Polymer Science: Polymer Chemistry Ed. vol. 22 3011-3025(1984) ccc 0360.6376/84/113011-15304.00 S. J. Havens, P.M. Hergenrotter.
"Flare, a Low Dielectric Constant, High T9. Thermally Stable Poly (arylene) ether) . . . " Polymer Preprints 37(1) 150 (1996) N.H. Hendricks and K.S.Y. Lau.
Styrese Terminated Resins as Interlevel Dielectrics for Multichip Modules 32 (2) 178 (1991) Joseph J. Zupanuc, Daniel C. Blazej, Thomas G. Baker, and Edmund A. Dinkel.
Functional Polymers and Sequential Copolymers by Phase Transfer Catalipis 2.sup.a Macromol Chem., 185, 1867-1880 (1984) Virgil Percec, Brian C. Auman.
Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis--Polymer Bulletin 10, 223-230 (1983) Virgil Percec and Peter L. Rinaldi.
A New Preparation of Chloromethyl Methyl Ether Free of Bis(Chloromethyl) Ether. Synthesis 970 (1979) J.S. Amato, S. Karady, M. Stetzinger, L.M. Weinstock).
A Simple and Inexpensive Procedure for Chloromethylation of Certain Aromatic Compounds. Tetrahedron Letters vol. 24, No. 18. pp. 1933-1936, (1983) Alexander M. Killop. Fereidon Abbase Madjdabade.
Synthesis of Intermediates for Production of Heat Resistant Polymers (Chloromethylation of Diphenyl Oxide) Zhurnal Prukladnoc Khimice, vol. 40 No. 11, pp. 2540-2546 Nov., 1967.

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