Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Antihalation or filter layer containing
Patent
1997-12-01
1999-07-27
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Antihalation or filter layer containing
430527, 430530, 430536, 430961, G03C 185, G03C 189, G03C 1825, G03C 176
Patent
active
059288485
ABSTRACT:
The present invention is a photographic element including a support, having on one side thereof at least one silver halide emulsion layer, and having on the other side an antistatic layer, and a protective overcoat. The protective overcoat is farthest from the support; and is a continuous polyolefin coating.
REFERENCES:
patent: 2627088 (1953-03-01), Alles et al.
patent: 2698235 (1954-03-01), Swindells
patent: 2698240 (1954-12-01), Alles et al.
patent: 2943937 (1960-06-01), Nadeau et al.
patent: 3143421 (1964-08-01), Nadeau et al.
patent: 3201249 (1965-08-01), Pierce et al.
patent: 3271178 (1966-09-01), Nadeau et al.
patent: 3501301 (1970-03-01), Nadeau et al.
patent: 4203769 (1980-05-01), Guesteaux
patent: 5006451 (1991-04-01), Anderson et al.
patent: 5147768 (1992-09-01), Sakakibara
patent: 5221598 (1993-06-01), Anderson et al.
patent: 5368995 (1994-11-01), Christian et al.
patent: 5679505 (1997-10-01), Tingler et al.
"Research Disclosure", Item 36544, Sep. 1994.
"Research Disclosure", Item 38957, Sep. 1996.
Appell Charles H.
Nair Mridula
Osburn Tamara K.
Eastman Kodak Company
Ruoff Carl F.
Schilling Richard L.
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