Aqueous cleaning of liquid residue by etching

Details Aqueous cleaning of liquid residue by etching Aqueous cleaning of liquid residue by etching

2007-11-08

2010-12-07

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including use of vacuum, suction, or inert atmosphere

C019S034000, C019S035000

Reexamination Certificate

active

07846262

ABSTRACT:
The present invention is a method of cleaning an object in an open aqueous cleaning system. The method is directed to an open cleaning vessel into which water used for cleaning a material or object can be introduced. A means is provided for introducing a reactant chemical to the vessel to form an aqueous solution. Cleaning of the surface is in the form of bubble formation on the part that vaporizes the chemical in order to react the oxidizer in the vapor state to the exposed surface at the bubble growth area. Treatment in the form of etching or any other process in which material is removed from a solid surface displaces the liquid residue from the surface. The resulting process produces no dissolution or emulsion of the contaminant and therefore can be easily separated from the chemical cleaner. The process also conserves chemistry, water, energy, and reduces pollution.

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