Aqueous cerium oxide dispersion

Details Aqueous cerium oxide dispersion Aqueous cerium oxide dispersion

2011-08-30

2011-08-30

Deo, Duy-Vu N (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C438S691000, C438S692000, C438S693000, C051S307000, C051S308000, C051S309000

Reexamination Certificate

active

08008201

ABSTRACT:
Aqueous cerium oxide dispersion Aqueous cerium oxide dispersion, containing 5 to 60% by weight cerium oxide. It can be used to polish SiO2in the semiconductor industry.

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Japanese Office Action in JP 2008-505852. Mailed Dec. 17, 2010. English translation provided.

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