Aqueous antireflective coatings for photoresist compositions

Details Aqueous antireflective coatings for photoresist compositions Aqueous antireflective coatings for photoresist compositions

1996-08-16

1997-07-29

Yoon, Tae

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

526288, 526312, 5253272, 525376, 430 97, 430423, 430435, C08F 830, C08F22600, G03G 1306

Patent

active

056522975

ABSTRACT:
The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.

REFERENCES:
patent: 4631328 (1986-12-01), Ringsdorf et al.
patent: 5207952 (1993-05-01), Griffin, III
patent: 5227444 (1993-07-01), Muller et al.
patent: 5384378 (1995-01-01), Etzbach et al.
patent: 5496899 (1996-03-01), Foll et al.

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