Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Photomechanical dye image prepared
Patent
1984-04-11
1985-07-23
Downey, Mary F.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Photomechanical dye image prepared
430193, 430309, 430326, 430331, G03C 518, G03C 152, G03C 500, G03F 700
Patent
active
045308950
DESCRIPTION:
BRIEF SUMMARY
BACKGROUND OF THE INVENTION
The present invention relates to an aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers based on silicates and at least one further component, and to a process for developing said layers.
Radiation-sensitive reproduction layers are used, for example, in the preparation of offset printing forms or of photoresists (below, both these are called copying materials), that is to say they are in general applied by the user or the manufacturer to a support. The supports used for these copying materials are metals, such as zinc, magnesium, chromium, copper, brass, steel, silicon, aluminum or combinations of these metals, plastic films, paper or similar materials. These supports can be coated with the radiation-sensitive reproduction layer without any modifying pretreatment, but preferably they are coated after carrying out a surface modification, such as mechanical, chemical and/or electrochemical roughening, an oxidation and/or treatment with agents rendering the surface hydrophilic (for example, in the case of supports for offset printing plates). In addition to at least one radiation-sensitive compound, the conventional reproduction layers contain in most cases also an organic binder (resins or the like) and, optionally, also plasticizers, pigments, dyes, wetting agents, sensitizers, adhesion-promoters, indicators and other customary auxiliaries. After they have been exposed, the reproduction layers are developed in order to produce an image from them. For example, a printing form or a photoresist is obtained in this way.
A developer for positive-working reproduction layers must be capable of dissolving those parts of the layer which have been struck by electromagnetic radiation (the later non-image areas) away from the exposed layer without substantially affecting those parts of the layer which have not been struck by the radiation (the later image areas).
In German Patent No. 12 00 133 (equivalent to U.S. Pat. No. 3,110,596), which can be mentioned as a representative example, the following are listed as examples of suitable developers: alkaline-aqueous solutions of phosphates, silicates, fluorosilicates, stannates, fluoroborates or fluorotitanates, which may additionally contain water-soluble hydrocolloids or organic solvents.
Various alternatives or modifications have been proposed by the prior art in order to improve these aqueous-alkaline developer solutions.
German Offenlegungsschrift No. 28 34 958 (=ZA-PS No. 79/4131) describes a process for developing positive-working light-sensitive layers based on o-naphthoquinone diazides and alkali-soluble resins, in which the exposed areas of the layer are washed out with a developer solution containing (a) a substance having an alkaline reaction, such as water glass, sodium metasilicate, Na.sub.3 PO.sub.4, K.sub.3 PO.sub.4, Na.sub.2 HPO.sub.4, K.sub.2 HPO.sub.4, NaOH, KOH, diethylamine, ethanolamine, or triethanolamine, and (b) a salt, oxide or hydroxide of an element of the groups IIa, IIIa or IIIb of the Periodic Table, such as calcium, strontium, or barium.
British Pat. No. 1,591,988 discloses a developing method for positive-working, light-sensitive layers which are based on o-naphthoquinone diazide esters and alkali-soluble resins, by means of a developer containing (a) 75 to 99.5 percent by volume of an aqueous-alkaline solution, for example, of Na-metasilicate or Na.sub.3 PO.sub.4, and (b) 0.5 to 25 percent by volume of an organic solvent, such as alkanols or alkane diols (or the monoethers thereof). Further components mentioned in the specification are NaOH, Na-benzoate, dimethylformamide, polyethylene glycol, Na.sub.2 HPO.sub.4 and tetrasodium ethylenediamine tetraacetate.
In IBM Technical Disclosure Bulletin, Vol. 13, No. 7, 12/1970, page 2,009 M. J. Grieco et al. state that aqueous-alkaline or alcoholic-alkaline solutions which do not contain Na.sup.+ ions, which have a pH range of from 9 to 13 and contain between 5 and 25 percent of tetramethylammonium hydroxide can be used for d
REFERENCES:
patent: 3110596 (1963-11-01), Heiss et al.
patent: 4141733 (1979-02-01), Guild
patent: 4411981 (1983-10-01), Minezaki
patent: 4423138 (1983-12-01), Guild
patent: 4464461 (1984-08-01), Guild
EP-A2 0 55 814--European Patent Application filed 10-27-81.
IBM Technical Disclosure Bulletin, vol. 13, No. 7, p. 2009.
IBM Technical Disclosure Bulletin, vol. 16, No. 2, p. 426.
Beutel Rainer
Simon Ulrich
Downey Mary F.
Hoechst Aktiengesellschaft
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