Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant
Patent
1991-12-09
1994-05-03
Skane, Christine
Compositions
Compositions containing a single chemical reactant or plural...
Organic reactant
134 38, 252153, 252171, 252542, 252549, 252DIG8, C11D 750, C11D 734, C11D 726, C09D 900
Patent
active
053085272
ABSTRACT:
Inexpensive paint stripper compositions, containing neither chlorinated, aromatic nor alkaline solvents and well adopted for removing glycerophthalic, alkyd-urethane, acrylic-polyurethane and epoxy paints from a variety of substrates, e.g., wood and metal substrates, comprise (a) from 1% to 20% by volume of an aprotic polar solvent selected from among dimethylsulfoxide, dimethylformamide, N-methylpyrrolidone, N-methylmorpholine, .gamma.-butyrolactone, acetonitrile and mixtures thereof; and (b) from 99% to 80% by volume of an ether selected from among methyltert-butylether, diethylether, tert-amylmethylether, tetrahydrofuran, dioxane and mixtures thereof.
REFERENCES:
patent: 2694658 (1954-11-01), Crepeau et al.
patent: 3673099 (1972-06-01), Corby et al.
patent: 4098719 (1978-07-01), Hushebeck
patent: 4120810 (1978-10-01), Palmer
patent: 4401748 (1983-08-01), Ward, Jr.
patent: 4428871 (1984-01-01), Ward
patent: 4444648 (1984-04-01), West
patent: 4661209 (1987-04-01), Berg
patent: 4664721 (1987-05-01), Valasek
patent: 4836950 (1989-06-01), Madsen
patent: 4983224 (1991-01-01), Mombrun
patent: 5015410 (1991-05-01), Sullivan
patent: 5085795 (1992-02-01), Narayanan
Lallier Jean-Pierre
Marie Patrick
Atochem
Skane Christine
Tierney Michael P.
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