Applying photoresist onto silicon wafers

Details Applying photoresist onto silicon wafers Applying photoresist onto silicon wafers

1979-07-26

1981-09-01

McIntosh, John P.

Coating apparatus

With means to centrifuge work

118 63, 118320, 118500, 134102, 134153, 354325, B05C 500, B05C 1106, B05C 1108, B05C 1302

Patent

active

042865417

ABSTRACT:
Applying photoresist to silicon wafers in the manufacture of integrated circuit chips by carrying the wafers upon a rotor in a chamber and spraying from a plurality of nozzles in the chamber toward the rotor for application to the wafers.

REFERENCES:
patent: 2069844 (1937-02-01), Paasche
patent: 3169676 (1965-02-01), Hanselmann
patent: 3489608 (1970-01-01), Jacobs et al.
patent: 3604331 (1971-09-01), Carberry et al.
patent: 3769992 (1973-11-01), Wallestad
patent: 3812514 (1974-05-01), Watabe
patent: 3846818 (1974-11-01), Merz
patent: 3911460 (1975-10-01), Lasky
patent: 3923156 (1975-12-01), Wallestad
patent: 3961877 (1976-06-01), Johnson
patent: 3973847 (1976-08-01), Gygax et al.
patent: 3974797 (1976-08-01), Hutson
patent: 3990088 (1976-11-01), Takita
patent: 3990462 (1976-11-01), Elftmann et al.
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4081816 (1978-03-01), Geyken et al.
patent: 4197000 (1950-04-01), Blackwood

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